Fujifilm XF 200mm F2 R LM OIS WR — Simulador de bokeh y ray-tracing óptico

Interactive 3D portrait ray-traced through the published US20190265504A1 optical prescription (19 elements in 14 groups) with a 100.0 mm entrance pupil and 1.8 m minimum focus.

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Especificaciones ópticas y de retrato (medio cuerpo)

Optical & Portrait Metric Measured / Patent Value What It Means in Practice
Patent Prescription US20190265504A1 · 19 elements in 14 groups Traced surface by surface in WebGL2
Entrance Pupil Diameter 100.0 mm (at f/2) Controls distant background blur disc size
Upper-Body Working Distance 12.20 m Camera-to-subject distance for head-to-waist framing
Effective Focal Length (Breathing) 203.5 mm (+1.7%) Actual framing focal length at portrait distance
Depth of Field (Sharp Zone) 43 cm (12 m – 12 m) Sharp zone at wide-open aperture
Minimum Focus Distance 1.8 m Closest focusing distance from the sensor

Preguntas

How much background blur does the Fujifilm XF 200mm F2 R LM OIS WR produce?

Wide open at f/2, the Fujifilm XF 200mm F2 R LM OIS WR has a 100.0 mm entrance pupil (200 mm ÷ 2). In an upper-body portrait at 12.20 m, the sharp depth-of-field zone spans 43 cm (12 m to 12 m), while mechanical vignetting and 19 glass elements shape the out-of-focus highlights.

Does the Fujifilm XF 200mm F2 R LM OIS WR show focus breathing at portrait distance?

Based on patent US20190265504A1, tracing the focusing group at 12.20 m gives an effective framing focal length of 203.5 mm (+1.7% vs. the nominal 200 mm). You can toggle "Match subject size" in the simulator to see the framing shift live.

What optical design is inside the Fujifilm XF 200mm F2 R LM OIS WR?

The patent prescription (US20190265504A1) specifies 19 lens elements in 14 groups. The interactive Optical X-Ray above traces rays through every surface in real time.

Comparaciones directas de patente con Fujifilm XF 200mm F2 R LM OIS WR

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Ver también: profundidad de campo, bokeh, factor de recorte, compresión.