Fujifilm XF 50mm F1.0 R WR — Bokeh- & optische raytracing-simulator

Interactive 3D portrait ray-traced through the published US20210231927A1 optical prescription (12 elements in 9 groups, 2 aspherical) with a 50.0 mm entrance pupil and 0.7 m minimum focus.

Scène wordt geladen…
0%

Optische & portretspecificaties (bovenlichaam)

Optical & Portrait Metric Measured / Patent Value What It Means in Practice
Patent Prescription US20210231927A1 · 12 elements in 9 groups (2 aspherical) Traced surface by surface in WebGL2
Entrance Pupil Diameter 50.0 mm (at f/1) Controls distant background blur disc size
Upper-Body Working Distance 3.06 m Camera-to-subject distance for head-to-waist framing
Effective Focal Length (Breathing) 48.5 mm (-2.9%) Actual framing focal length at portrait distance
Depth of Field (Sharp Zone) 22 cm (2.95 m – 3.17 m) Sharp zone at wide-open aperture
Minimum Focus Distance 0.7 m Closest focusing distance from the sensor

Vragen

How much background blur does the Fujifilm XF 50mm F1.0 R WR produce?

Wide open at f/1, the Fujifilm XF 50mm F1.0 R WR has a 50.0 mm entrance pupil (50 mm ÷ 1). In an upper-body portrait at 3.06 m, the sharp depth-of-field zone spans 22 cm (2.95 m to 3.17 m), while mechanical vignetting and 12 glass elements shape the out-of-focus highlights.

Does the Fujifilm XF 50mm F1.0 R WR show focus breathing at portrait distance?

Based on patent US20210231927A1, tracing the focusing group at 3.06 m gives an effective framing focal length of 48.5 mm (-2.9% vs. the nominal 50 mm). You can toggle "Match subject size" in the simulator to see the framing shift live.

What optical design is inside the Fujifilm XF 50mm F1.0 R WR?

The patent prescription (US20210231927A1) specifies 12 lens elements in 9 groups with 2 aspherical surfaces. The interactive Optical X-Ray above traces rays through every surface in real time.

Directe patentvergelijkingen met Fujifilm XF 50mm F1.0 R WR

Verwante vergelijkingen

Alle objectiefvergelijkingen

Zie ook: scherptediepte, bokeh, cropfactor, compressie.